stage
ALD chamber
PVD chamber
in-situ metrology
The framework directly integrates interchangeable PVD sources (magnetron sputtering, evaporation, e-beam), thermal or PE-ALD modes, custom sample stages, and in-situ metrology into a single system.
Define exact layer transitions between (PE)-ALD and PVD under continuous vacuum. The software provides granular parameter control over the entire deposition recipe, executing hundreds of nanolayers autonomously without intermediate manual transfers.
Integrating ALD and PVD broadens the available variables for thin film engineering. By alternating these deposition mechanisms, researchers can synthesize custom nanolaminates, tuning the structural, electrical, and optical properties of the stack to exact specifications.
Every system is tailored to specific deposition requirements. Contact our engineering team to review your process parameters and define the exact hardware configuration for your lab.
Discuss System Configuration