Advanced Thin Film Solutions
SC-1

ALD/PVD Cluster

The first (PE)-ALD and PVD cluster system in a compact and modular equipment

SC-1 exploded view stage ALD chamber PVD chamber in-situ metrology

Modular

The framework directly integrates interchangeable PVD sources (magnetron sputtering, evaporation, e-beam), thermal or PE-ALD modes, custom sample stages, and in-situ metrology into a single system.

Programmable
Layer Sequencing

Define exact layer transitions between (PE)-ALD and PVD under continuous vacuum. The software provides granular parameter control over the entire deposition recipe, executing hundreds of nanolayers autonomously without intermediate manual transfers.

Expanded Parameter Space.

Integrating ALD and PVD broadens the available variables for thin film engineering. By alternating these deposition mechanisms, researchers can synthesize custom nanolaminates, tuning the structural, electrical, and optical properties of the stack to exact specifications.

TEM image showing a 200 multinanolayered coating of 20 nm of PVD Al and 1 nm of ALD Al2O3
TEM image showing a 200 multinanolayered coating of 20 nm of PVD Al and 1 nm of ALD Al2O3.

Technical Specifications.

Interchangeable
Substrate Holders
4 – 6 in. Wafers
High temperature (~900 °C) rotational, bias and z-stages
Temperature Gradient Stages (30 °C to 450 °C)
ALD Materials
Al2O3, ZnO, SiO2, TiO, Y2O3, ZrO2, HfO2, LiNbO5, Nitrides, and others.
Precursors
Up to 8 gas sources with 6 individual inlets
Ozone option
Novel bubbler delivery system optimised for low vapour pressure precursors
Magnetrons Option
Up to 4 confocal 3 in. magnetrons
E-beam Option
Quad-pocket 4x 8cc
Evaporation Option
Up to 4 sources of 10cc
In-Situ Metrology Options
Wafer stress measurement
OES
Mass Spectrometry
Ellipsometry
Additional Options
Glovebox integration
Plasma option
Interfacing
Possible to interface with MES systems or other interfaces

Configure Your Architecture

Every system is tailored to specific deposition requirements. Contact our engineering team to review your process parameters and define the exact hardware configuration for your lab.

Discuss System Configuration