For smarter and faster R&D

SC-1 Series

The first (PE)-ALD and PVD cluster system in a compact and modular equipment

The SC-1 is a ground-breaking and high-performing cluster equipment that combines Atomic Layer Deposition (ALD) with Physical Vapor Deposition (PVD) in an extremely compact, modular, and fully automated system for high-throughput production of multinanolayered coatings from the ALD and PVD materials library. 

This innovative patent-pending cluster system revolutionizes the traditional cluster equipment, as it eliminates the need for transfer arms and multiple antechambers, which occupy a significant amount of lab space, with high acquisition, operating and maintenance costs.

  • Capable of performing both (PE)-ALD and PVD without breaking the vacuum or move the samples between chambers to fabricate hundreds of multinanolayered films, reducing fabrication time.

  • Scalable, modular and flexible system that allows to easily increase or decrease chamber dimensions, adapt new hardware and incorporate multiple in-situ metrology equipment.

Why ALD and PVD?

The combination of ALD and PVD without breaking vacuum offer several advantages to fabricate advanced materials with tailored functionalities and properties. One of the primary benefits is the ability to achieve high-quality interfaces between the different layers of the coating material. The introduction of very conformal and pinhole-free films via ALD can stabilise the grain size of the PVD layers and hinder grain growth, which translates to improved mechanical and thermal properties.


Additionally, the material is not exposed to air and therefore there is no risk of contamination or oxidation. Since both ALD and PVD can deposit materials with atomic-level precision, combining the two techniques can allow for the creation of highly complex structures with unique properties that cannot be achieved using other methods.

Combining ALD and PVD without breaking vacuum can be a powerful approach to creating advanced materials with tailored functionalities and properties for a wide range of applications, including those in the semiconductor industry, optical coatings, hard coatings, and medical industry among others.

Breaking the Grain-Growth

The combination of ALD and PVD layers creates a unique microstructure  by stabilising grain size and hindering grain growth, which translates to improved mechanical and thermal properties.

TEM image showing a 200 multinanolayered coating of 20 nm of PVD Al and 1 nm of ALD Al2O3.

Technical Specifications


Interchangeable Substrate Holders4 - 6 in. wafers
High temperature (~900 °C) rotational and z-stages
Temperature Gradient Stages (30 °C to 450 °C)
ALD Precursor LinesFront loading with guided door
Custom-made frame holders for 3D parts
Cleanroom compatible
Glovebox compatible
MagnetronsUp to 500°C
In-Situ Metrology EquipmentUp to 8 gas sources with 6 individual inlets
Ozone option
ALD-PVD MaterialsAl₂O₃, ZnO, SiO₂, TiO₂, Y₂O₃, Nitrides
Novel bubbler delivery system optimised for low vapour pressure precursors
500 nm Al₂O₃ < 1% 1-sigma uniformity

Electronics and Software

Mass Flow Controllers4 Analog MFC
60 Digital MFC
Pneumatic (ALD) valves24 valves
Pressure Sensors4 Analog
Gate valves3 gate valves with feedback
Flow meters4 Flow meters
Temperature16 Channel PID regulation with K-Type sensors
4 PT100/PT1000
Interlocks8 Interlock in
12 Interlock out
Additional Connections2 Ethernet
2 RS485
SoftwareManual control
Recipe Creator

Customised to your requirements

The SC-1 can be customised to meet your material and process requirements. Contact us for quotations or any other inquiries.